Results forgr1 tantalum sputtering targetfrom 339 Products.
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Tantalum Plate 99.95% Pure Tantalum Sputtering Target/tantalum Plate /sheet/disc A tantalum sputtering target is a disc-shaped material made of high-purity tantalum metal and is ...
china
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Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ≥99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, ...
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Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target ...
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Gr1 Gr2 TiAl TiCr TiCu Titanium sputter target for coating industry Titanium targets/ titanium sputter target are widely used: when electronic components (such as common CD storage...
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a ...
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Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious ...
china
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: ...
china
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
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Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating Description: 1. An important way to make thin-film material ...
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target plate device. It is used to ...
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Torich 133*4*4113mm 304L Alloy Sputtering Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
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Multi-Function Magnetron Sputtering Metallizer Used For Coating PET Film Product Description Magnetron sputtering is composed of a vacuum system, a winding system, a magnetron ...
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--Glass processing chamber: ∮100mm; 130mm High. --Specimen stage size: ∮40mm( Hold 6 specimen cups) --Golden target size: ∮58mm*0.12mm(thickness) --Vacuum detection: Pirani gage -...
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Product Description: Longpu solar vacuum tube adopts interference solar absorption layer and unique three-target magnetron sputtering coating technology.Even at high temperatures ...
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Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step ...
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