Results forsemiconductor coating tantalum sputtering targetfrom 1927 Products.
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
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This high cost-effective PET single-sided silicone release film has mainly been applied in the following areas: 1. Electronics: In the manufacturing of electronic products, PET ...
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Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ≥99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, ...
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Tantalum Plate 99.95% Pure Tantalum Sputtering Target/tantalum Plate /sheet/disc A tantalum sputtering target is a disc-shaped material made of high-purity tantalum metal and is ...
china
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High Purity Titanium Metal Sputtering Target For Thin Film Coating, Tantalum / Rhodium /Ruthenium Sputtering Target Square Pure Titanium Sputtering Target High Purity 99.995% ...
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Gr1 Gr2 TiAl TiCr TiCu Titanium sputter target for coating industry Titanium targets/ titanium sputter target are widely used: when electronic components (such as common CD storage...
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Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious ...
china
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High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel ...
china
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a ...
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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--Glass processing chamber: ∮100mm; 130mm High. --Specimen stage size: ∮40mm( Hold 6 specimen cups) --Golden target size: ∮58mm*0.12mm(thickness) --Vacuum detection: Pirani gage -...
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PVD magnetron sputtering machine continuous coating for automotive parts chrome plating decoration reflection coating Goldstone is engaged to develop the professional vacuum ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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Indium Coating Machine Target Welding Machine 20Khz Metal and Non Metal Surface Coating Indium Technology Description: Indium coating machine, also known as target welding machine, ...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10...
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Tantalum Rod Tantalum is a shiny, silvery colored metal which is heavy, dense, malleable and ductile when pure. It is found in small quantities in minerals (generally in conjunctio...
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Multi-Function Magnetron Sputtering Metallizer Used For Coating PET Film Product Description Magnetron sputtering is composed of a vacuum system, a winding system, a magnetron ...
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