Powder Metallurgy Tungsten Sputtering Target Smooth Surface High Resistance To Radiation

Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating

Description:

1. An important way to make thin-film material is sputtering—a new way of physical vapor deposition (PVD).

The thin-film made by target is characterized by high density and good adhesiveness.

As the magnetron sputtering techniques being widely applied, the high pure metal and alloy targets are in great need.

Being with high melting point, elasticity, low coefficient of thermal expansion, resistivity and fine heat stability, pure tungsten and tungsten alloy targets are widely used in semiconductor integrated circuit, two-dimensional display, solar photovoltaic, X ray tube and surface engineering.

2.It can work with both older sputtering devises as well as the latest process equipments, such as large area coating for solar energy or fuel cells and flip-chip applications.

Features:

1.Tungsten sputtering target adopts best demonstrated techniques including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP);

2.Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure and fine grain;

3.Our tungsten sputtering target has been approved by the ASTM B 760-2007 and GB 3875-2006.

Parameters of Tungsten Sputtering Target:

Tungsten sputtering targets are also produced according to customers' requirements.

Package and Inspection:
We offer material composition sheet and examination report which include density, flaw detection, dimensions and so on.

Our products are packed in plywood case with expanded plastic. Each piece of tungsten sputtering target is separated by water proof paper.