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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

Shaanxi Peakrise Metal Co.,Ltd

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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

Country/Region china
City & Province baoji Shaanxi
Categories Other Metals & Metal Products
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Product Details

Product Information:

 

Name  PVD coating tantalum target
Grade  Ta1 Ta2 RO5200 RO5400 RO5252 RO5255
Purity   ≥99.95%
Density   16.68g/cm3
Surface   Machined surface, no pits, scratches, stains, burrs and other defects
Standard   ASTM B708
Shape  Flat target, Rotating target ,Special-shaped customization

 

 

Chemical Content of PVD Coating Tantalum Target:

 

GradeMain elements Impurity content less than %
 TaNbFeSiNiWMoTiNbOCHN
Ta1Remain——0.0050.0050.0020.010.010.0020.040.020.010.00150.01
Ta2Remain——0.030.020.0050.040.030.0050.10.030.010.00150.01
TaNb3Remain<3.50.030.030.0050.040.030.005——0.030.010.00150.01
TaNb20Remain17.0~23.00.030.030.0050.040.030.005——0.030.010.00150.01
Ta2.5WRemain 0.0050.0050.00230.010.0020.040.020.010.00150.01
Ta10WRemain 0.0050.0050.002110.010.0020.040.020.010.00150.01

 

Feature of PVD Tantalum Target:

 

High melting point,
Low steam pressure,
Good cold working performance,
High chemical stability,
Strong resistance to liquid metal corrosion,
The surface oxide film has a large dielectric constant

 

Application:

 

The tantalum target and the copper back target are welded, and then semiconductor or optical sputtering is performed, and the tantalum atoms are deposited on the substrate material in the form of oxides to achieve sputtering coating; tantalum targets are mainly used in semiconductor coating, optical coating and other industries . In the semiconductor industry, metal (Ta) is currently mainly used to coat and form a barrier layer through physical vapor deposition (PVD) as a target material.

 

We can process according to customer's drawing, and produce Ta rod,plate,wire,foil,crucible etc.

 


 

Please send us an inquiry for more information

 

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