Results forsio2 sputtering targetfrom 396 Products.
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Product Description: Steam Blowing Target Plate This steam blowing target plate is a double mirror high precision aluminum target plate, with a sputtering target and an iron target ...
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Laboratory Magnetron Sputtering Vacuum Coating System 1. The UHV sputtering system is equipped with DC sputtering guns to deposit the semi-conductive and non-conductive materials ( ...
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Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) ...
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Product Description: Steam Blowing Target Plate is made of high quality aluminum, copper and iron, and processed by casting technology. It is widely used in steam blowing ...
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Magnetron Sputtering Sources - Planar Sputtering Cathode What is magnetron sputtering technology? Magnetron sputtering is another form of PVD coating technology. Plasma coating ...
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Magnetron Sputtering Deposition in Medical Treatment Industry Applications Applications Specific Purpose Material Type Medical treatment Biocompatible materials Al2O3, TiO2 Working ...
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Product Description: Steam Blowing Target Plate is a type of iron plate designed for the purpose of steam purging. It has a high pressure processing technology and can be used for ...
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PVD Magnetron Sputtering Coating Machine 1. Magnetron sputtering is a plasma coating process where by sputtering material is ejected due to bombardment of ions to the target ...
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Magnetron Sputtering Deposition in Magnetic Recording Industry Applications Applications Specific Purpose Material Type Magnetic recording Vertical magnetic recording film CoCr ...
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purge target plate base and aluminum target plate hrc≥45 customized size Product Description: The Steam Blowing Target Plate is a custom-made product made of high-quality materials...
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PVD Magnetron Sputtering Coating Machine 1. Magnetron sputtering is a plasma coating process where by sputtering material is ejected due to bombardment of ions to the target ...
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target sputtered aluminum sheet Product Description: Steam Blowing Target Plate is made of high pressure steam purge finish Ra1.6 aluminum, with a thickness of 5-10mm, and a ...
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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets Au Gold Magnetron Sputtering on Silicon Wafers Summary: With PVD DC sputtering ...
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Product Description: Steam Blowing Target Plate Our steam blowing target plate is high pressure, specially designed for steam blowing application. The surface is carefully treated ...
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Vacuum Flask Copper Plating Equipment, Copper Sputtering Deposition System, TiN and TiC Vacuum Plating The thick copper film is for thermal isulation between inner and outer ...
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Product Description: Steam Blowing Target Plate is an ideal product designed for high pressure steam blowing application. It is made of an aluminum flush tube purge, aluminum ...
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Magnetron Sputtering Sources - Planar Sputtering Cathode Magnetron Sputtering Sources Specifications Key Features 1. Finite element magnetic field design 2. Magnet isolated from ...
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Product Description: Steam Blowing Target Plate is a specialized device designed for high-pressure steam purging. It is constructed with a Rectangle shape and has a tolerance of ±0...
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Cylindrical Sputtering Sources, Cylinder Sputtering Cathode, Magnetron Sputtering Source Magnetron Sputtering Sources Specification Key Features 1. Finite element magnetic field ...
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