Results forsio2 sputtering targetfrom 396 Products.
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High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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high quality titanium target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the ...
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High Purity 99.97% Tungsten Target For Sputtering Coating Introduction 1. Tungsten sputtering target adopts best-demonstrated techniques including X-ray fluorescence (XRF), glow ...
china
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target plate device. It is used to ...
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Copper/Aluminum/Carbon Sputtering Equipment, High Vacuum Magnetron Sputtering Deposition System UHV Sputtering deposition system uses the sputtering cathodes as the PVD deposition ...
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Magnetron Sputtering Deposition in Optical recording Industry Applications Applications Specific Purpose Material Type Optical recording Phase change disc recording film TeSe, SbSe...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Titanium Target Cylindirc PVD sputtering target 100x40mm 300x40mm Titanium target is mainly used in mechanical equipment, electronic equipment, electroplating equipment, aviation, ...
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Tungsten Rotatable Sputtering Target Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgi...
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Working Principle: Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a ...
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Product Description: Steam Blowing Target Plate is a kind of pipe purge sputtering copper target plate and high pressure steam purging target plate, which is designed for steam ...
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Magnetron Sputtering Deposition in Optics Industry Applications Applications Specific Purpose Material Type Optics Optical films such as antireflection film, high-low refractive ...
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Dia 2'' 3'' 4'' Astm B381 Titanium target Pure Ti Coating Sputtering material 1. Product Information Product name Dia 2'' 3'' 4'' Astm B381 Titanium target Pure Ti Coating ...
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Product Description: Steam Blowing Target Plate is a kind of essential part in many industrial processes, which is made of aluminum, copper, iron material with rectangle shape, ...
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99.95% purity Ta Sputtering target sheet for semiconductor coatings and optical coatings 1. Uses: mainly used in semiconductor coatings and optical coatings. Purity: 99.95% -99.99%...
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Product Description: Our Steam Blowing Target Plate is a custom-made product for boiler purge and high pressure steam blowing. It is made of aluminum and is designed to withstand ...
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2.5MPa Steam Blowing Aluminum Target Plate High Temperature Sputtering Aluminum Target Plate Mirror Aluminum Target Plat *, *::before, *::after {box-sizing: border-box; } * {margin...
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Product Description: Our Steam Blowing Target Plate is designed with a superior quality custom-made size and a tight tolerance of ± 0.1mm. This product is made of aluminum and iron ...
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