Results forsio2 sputtering targetfrom 399 Products.
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Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of ...
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Purity Density (g/cm3) Shape & Size 99.9% 2.21 Circular Φ18~30x7~18mm Rine Φ230~350x5~20mm Plate
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China Wholesale High Performance Fused Quartz Glass Ring Silicon dioxide, also known as silica, has a chemical formula of SiO2. It has a melting point of 1,610°C, a density of 2...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate Titanium target Titanium sputtering target ...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g...
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Titanium Tube Target Titanium TA2 ASTM B861-06 a 133OD*125ID*2644L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2644 Grade TA2 Packaging Wooden case Port of ...
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Target name: aluminum target Common Purity: 99.9% (3N) 99.99% (4N) 99.999% (5N) 99.9999% (6N) Common dimensions: 100*40mm Maximum size: long 3000mm
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China Wholesale High Performance Fused Quartz Glass Ring Silicon dioxide, also known as silica (from the Latin silex), is an oxide of silicon with the chemical formula SiO2, most ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g...
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Titanium Tube Target Titanium TA2 ASTM B861-06 a 133OD*125ID*2644L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2644 Grade TA2 Packaging Wooden case Port of ...
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Main technical indexes: 1. ultimate vacuum: ≤6.6X10³Pa 2. vacuum acquisition system adopts molecular pump + mechanical pump unit 3. continuous pumping for 30 minutes, the vacuum ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate Titanium target Titanium sputtering target ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target 99.999% high-purity sputtering target experimental elemental titanium Customized Titanium Target Titanium Round Target product Pure titanium (TI) target) purity 2N8...
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Titanium target 99.999% high-purity sputtering target experimental elemental titanium Customized Titanium Target Titanium Round Target product Pure titanium (TI) target) purity 2N8...
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