Results forfrosting silicon dioxide sputtering targetfrom 1237 Products.
|
|
Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1...
|
|
|
|
|
Molybdenum Rotatable Sputtering Target Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High ...
china
|
|
|
|
|
Molybdenum Target For Vacuum Sputtering Coating 1. Molybdenum target for vacuum sputtering coating description: Molybdenum sputtering targets, namely molybdenum targets, are ...
|
|
|
|
|
lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Silicon sputtering targets are a type of material used in the process of sputtering, ...
china
|
|
|
|
|
Chromium sputtering target The chromium sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, ...
china
|
|
|
|
|
The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded ...
|
|
|
|
|
Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
|
|
|
|
|
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: ...
|
|
|
|
|
TZM Molybdenum and the alloys Disc sheet plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High ...
|
|
|
|
|
Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high ...
|
|
|
|
|
Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are ...
|
|
|
|
|
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
|
|
|
|
|
Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port ...
|
|
|
|
|
650g Silica Fireproof Blanket 96% Silicone Dioxide Cloth Protection Garment Unionfull Group Ltd has been known to manufacture excellent range of High Silica Cloths. The silica ...
|
|
|
|
|
Good Transparency White Fine Powder Silicon Dioxide Used For Industrial Coatings Silicon dioxide DR-388 uses a unique production process and organic surface treatment, is suitable ...
|
|
|
|
|
Silicon Dioxide Quartz Heater Tube , Uv Glass Tube 1683 Degree Celsius Softening Point Fused Silica Capillary Fused Silica Capillary Tubing Description: Density 2.2x103 kg/m3 ...
china
|
|
|
|
|
Japan NTTAT ADS-127 Silicon Dioxide Final Polishing Film Model:ADS-127 Place of Origin:Japan Quick Detail ● Evenly-sprayed particles on coated surface ● Good intensity & flexility, ...
|
|
|
|
|
Nano Silicon Dioxide CAS#: 14808-60-7 M.W: 60.08 Specification: Type Apperance Particle Size Purity (%) Specific Surface Area (m2/g) PH Character and Application BS-SP15 White ...
|
|
|
|
|
XSG size silicon dioxide spin flash dryer XSG Series High-Speed Rotating Dryer Features 1. This machine combines the whirl technology with the fluidization, ejection and smashing ...
|
|
|
|
|
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
|
|
|
You may also be interested in :
