Results formagnetron cr sputtering target 127mmfrom 755 Products.
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Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port ...
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pvd chromium sputtering target/chrome target price/Cr sputtering target Chromium sputtering targets are a type of material used in the process of sputtering, which is used to ...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
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High purity pvd titanium sputtering target Metal target customized Sputtering target can be devided into rotating target, plane target, multi-arc target according to the working ...
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Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: ...
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: ...
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TZM Molybdenum and the alloys Disc sheet plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High ...
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Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high ...
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
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Magnetron Sputtering Deposition in Perovskite Thin-film Battery Industry Applications Applications Specific Purpose Material Type Perovskite thin-film battery Transparent ...
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a ...
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Pens Gold Plating Machine , IPG Gold Jewelry Magnetron Gold Sputtering System IPG gold is short saying of Interior Plating Gold, it is the PVD process to deposit solid Au gold ...
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Titanium Target Pure Metal Sputtering Target High Purity Metal Magnetron Sputter Target For PVD Coating High Purity Titanium target High-purity and high-density sputtering targets ...
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Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your ...
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Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating Description: 1. An important way to make thin-film material ...
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
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