Results fortantalum tungsten sputtering targetfrom 588 Products.
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
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Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin...
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High Quality High Purity High Density Tungsten Sputtering Target Tungsten sputtering targets are a type of material used in a process called sputtering, which is used to deposit ...
china
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, ...
china
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Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating Description: 1. An important way to make thin-film material ...
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Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating Tantalum is most widely used in the electronic industry and as a ...
china
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a ...
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Ti Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' ...
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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High Purity Titanium Metal Sputtering Target For Thin Film Coating, Tantalum / Rhodium /Ruthenium Sputtering Target Square Pure Titanium Sputtering Target High Purity 99.995% ...
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
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Tungsten Molybdenum Target For Vacuum Sintering Furnace 1. Product Details: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than 20ppm It's widely used ...
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target plate device. It is used to ...
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Flexural Strength Tungsten Carbide Strips For Finger Jointing Tool Introduction of Tungsten Bar Stock Tungsten Bar Stock is a powder metallurgy product consisting mainly of a hard ...
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Suitable For Refractory Alloys Stainless Steel Tungsten Carbide Inserts Product Description: Tungsten carbide-based cemented carbides include tungsten cobalt (YG), tungsten cobalt ...
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Long Tungsten Carbide Blasting Nozzle , High Pressure Water Jet Cleaning Nozzles Tungsten Carbide Blasting Nozzle Introduction 1.100% fresh material,we also coating tantalum tin ...
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