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51mm Double Side Polished Sapphire Substrates DSP Wafer

Chongqing Silian Optoelectronic Science & Technology Co., Ltd.
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Address: No.99 Tong Xi Road, Caijia Town, Beibei District, Chongqing,China

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Chongqing Silian Optoelectronic Science & Technology Co., Ltd.

51mm Double Side Polished Sapphire Substrates DSP Wafer

Country/Region china
City & Province chongqing chongqing
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Product Details

Dia 51mm 2 inch Sapphire Substrate Wafer Double Side Polished DSP Wafer

 

Description

 

Al2O3 single crystal (Sapphire, also known as white stones, sapphire) has good thermal properties, excellent electrical characteristics and dielectric properties, and anti-chemical corrosion, it is high temperature, thermal conductivity, high hardness, infrared transparent, chemically stable good. Widely used in high-temperature infrared window materials and III-V nitride epitaxial film substrate and a variety of materials to meet the growing blue, purple, white light-emitting diode (LED) and blue laser (LD) needs, Branch Crystal company specializing in the production of high quality polished sapphire crystal and   epitaxial substrates will provide you with a lot of high quality and low price monocrystalline substrate.

 

Specification

 

ParameterSpecification
MaterialHigh purity >99.995%
Diameter51±0.1mm
Thickness300+10/-15μm
Crystal OrientationC-plane 0° to M-axis ±0.2°
C-plane 0° to A-axis ±0.2°
Bow≤10μm
Warp≤15μm
TTV≤7μm
Front side Roughness≤0.5nm
Back side Roughness≤0.5nm
Wafer EdgeType R
Roundness≤0.05mm
Transparency410~780nm:≥85%
RORMin≥200N
Harnesses≥1450
AppearanceScratch:≤0.1mm ≤2
Bubble: Dia≤0.1mm ≤3

 

The 2inch DSP double side polished sapphire substrates can be manufactured from high quality optical grade Kyropoulos grown sapphire crystals.

high purity single crystal sapphire epitaxial substrate is suitable for direct epitaxial process, PSS process, ALN process and other epitaxial methods. It has the characteristics of uniform wavelength, high brightness and small STD. we can accept product customization for the technical specifications, and produce sapphire single / double polishing substrates with different external dimensions based on C (0001), a (11-20) and m (1100) crystal orientations, with notch or straight edge crystal orientations.

 

 

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