Results forrotatable tungsten sputtering targetfrom 1290 Products.
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Working Principle: Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a ...
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Tungsten Carbide Rock Drilling Tools T38 / R38 Thread Button Bits With Heat Treatment Process Describtion In top hammer drilling, the shank adapter transmits impact energy from the ...
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Tungsten Carbide T45 Threaded Drill Shank Adapter Mining Systems Description In top hammer drilling, the shank adapter transmits impact energy from the piston to the rod(s) or tube...
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Tungsten Carbide Drill Shank Adapter For Tunneling 635mm Description In top hammer drilling, the shank adapter transmits impact energy from the piston to the rod(s) or tube(s). ...
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Product Description: Steam Blowing Target Plate is a kind of pipe purge sputtering copper target plate and high pressure steam purging target plate, which is designed for steam ...
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Product Description: Steam Blowing Target Plate is a kind of essential part in many industrial processes, which is made of aluminum, copper, iron material with rectangle shape, ...
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Niobium Tube Target Vacuum Coating Target 155OD*125ID*2000 Seamless Tube Item name Niobium Tube Targets Size φ155*Iφ125*2000 Packaging Vacuum package in wooden case Port of place ...
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Copper/Aluminum/Carbon Sputtering Equipment, High Vacuum Magnetron Sputtering Deposition System UHV Sputtering deposition system uses the sputtering cathodes as the PVD deposition ...
china
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Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium plate target Size 127*458*10 Grade Pure>3N5 Packaging Vacuum package in wooden case Port of ...
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Titanium Tube Target 133OD*125ID*2140L Titanium Gr2 ASTM B861-06 a Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Vacuum package in ...
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Titanium Tube Target Vacuum Coating Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840 Item name Titanium tube target Size φ133*φ125*840 Grade Gr1 Packaging Vacuum package in ...
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Titanium Tube Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840L Vacuum Coating Target Sputtering Item name Titanium tube target Size φ133*φ125*840 Grade Gr1 Packaging Vacuum ...
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Product Description: Our Steam Blowing Target Plate is a custom-made product for boiler purge and high pressure steam blowing. It is made of aluminum and is designed to withstand ...
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1 Year Warranty Full Auto Stainless Steel Watch PVD Sputtering Equipment Other Technical Details Arc Target Size Diameter100mm x Thickness40mm Arc Power Supply 200A Heating System ...
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Copper/Aluminum/Carbon Sputtering Equipment, High Vacuum Magnetron Sputtering Deposition System Anti Finger Print Coating Plasma Hardening Treatment (PHT) UHV Sputtering deposition ...
china
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Copper Tube Target 155OD*125ID*888 Oxygen-Free Copper Pure 99.97% Product Copper Tube Target Size φ155*φ125*888 Grade Oxygen-free copper Packaging Vacuum package in wooden case ...
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2.5MPa Steam Blowing Aluminum Target Plate High Temperature Sputtering Aluminum Target Plate Mirror Aluminum Target Plat *, *::before, *::after {box-sizing: border-box; } * {margin...
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Product Description: Our Steam Blowing Target Plate is designed with a superior quality custom-made size and a tight tolerance of ± 0.1mm. This product is made of aluminum and iron ...
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Product Description: Steam Blowing Target Plate This steam blowing target plate is a double mirror high precision aluminum target plate, with a sputtering target and an iron target ...
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Mid-Frequency Magnetron Sputtering Coating Machine / MF Sputtering System Magnetron Sputtering Vacuum Coating is a type of PVD Ion Plating surface treatment menthod. It can be used ...
china
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