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Semi-Insulating , InP Wafer , 3”, Prime Grade, For Electronic And Photonic Devices

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XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.

Semi-Insulating , InP Wafer , 3”, Prime Grade, For Electronic And Photonic Devices

Country/Region	china
City & Province	xiamen fujian
Categories	Silver & Sterling Silver Jewelry

Product Details

Semi-Insulating , InP Wafer , 3”, Prime Grade, For Electronic And Photonic Devices

PAM-XIAMEN manufactures high purity single crystal Indium Phosphide Wafers for optoelectronics applications. Our standard wafer diameters range from 25.4 mm (1 inch) to 200 mm (6 inches) in size; wafers can be produced in various thicknesses and orientations with polished or unpolished sides and can include dopants. PAM-XIAMEN can produce wide range grades: prime grade, test grade, dummy grade, technical grade, and optical grade. PAM-XIAMEN also offer materials to customer specifications by request, in addition to custom compositions for commercial and research applications and new proprietary technologies.

Semi-Insulating, InP Wafer, 3”, Prime Grade

3"InP Wafer Specification
Item	Specifications
Conduction Type	SI-type
Dopant	Iron
Wafer Diameter	3"
Wafer Orientation	100±0.5°
Wafer Thickness	600±25um
Primary Flat Length	8±1mm
Secondary Flat Length	8±1mm
Carrier Concentration	≤3x10¹⁶cm^-3	(0.8-6)x10¹⁸cm^-3	(0.6-6)x10¹⁸cm^-3	N/A
Mobility	(3.5-4)x10³cm²/V.s	(1.5-3.5)x10³cm²/V.s	50-70cm²/V.s	＞1000cm²/V.s
Resistivity	N/A	N/A	N/A	＞0.5x10⁷Ωcm
EPD	<1000cm^-2	<500cm^-2	<1x10³cm^-2	<5x10³cm^-2
TTV	<12um
BOW	<12um
WARP	<12um
Laser Marking	upon request
Suface Finish	P/E, P/P
Epi Ready	yes
Package	Single wafer container or cassette

Wafer Cleaning

Wafer cleaning is an integral part of the wafer industry. The cleaning process involves the removal of particulate and chemical impurities from the semiconductor. It’s imperative during the cleaning process that the substrate is not damaged in any way. Wafer cleaning is ideal for silicon-based materials since it’s the most common element that is used. Some of the benefits of wafer cleaning include:

No damage to the silicon
Environmentally friendly
Safely and effectively removes any surface contaminants and imperfections
Enhances the performance of the wafer

Impact Ionization

	The dependence of ionization rates for electrons αi and holes βi versus 1/F, 300 K. (Cook et al. [1982]).
	Breakdown voltage and breakdown field versus doping density for an abrupt p-n junction, 300 K (Kyuregyan and Yurkov [1989]).

Applications

The application fields of InP splits up into three main areas. It is used as the basis

- for optoelectronic components

- for high-speed electronics.

- for photovoltaics

There is still a vastly under-utilized, yet technically exciting zone in the electromagnetic spectrum between microwaves and infrared, often referred to as “Terahertz”. Electromagnetic waves in this range possess hybrid properties they show high-frequency- and optical characteristics simultaneously. InP based components unlock this spectral range for important new applications.

Are You Looking for an InP substrate?

PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InP wafers, send us enquiry today to learn more about how we can work with you to get you the InP wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!