Results forti sputtering targetfrom 362 Products.
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
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Ti Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' ...
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pvd chromium sputtering target/chrome target price/Cr sputtering target Chromium sputtering targets are a type of material used in the process of sputtering, which is used to ...
china
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a ...
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: ...
china
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Molybdenum Target For Vacuum Sputtering Coating 1. Molybdenum target for vacuum sputtering coating description: Molybdenum sputtering targets, namely molybdenum targets, are ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target ...
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
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Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating Description: 1. An important way to make thin-film material ...
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DC Magnetron Sputtering Coating Machine on Glass Mirrors , Titanium Ti Glass Mirror Vacuum Metallizing Equipment DC Sputtering Metallizer on Glass Mirrors, Titanium Ti Glass Mirror ...
china
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Magnetron Sputtering Deposition in Semiconductor Industry Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, wiring film AI, Al-Si, Al-Si-Cu, ...
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target plate device. It is used to ...
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Torich 133*4*4113mm 304L Alloy Sputtering Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
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Multi-Function Magnetron Sputtering Metallizer Used For Coating PET Film Product Description Magnetron sputtering is composed of a vacuum system, a winding system, a magnetron ...
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--Glass processing chamber: ∮100mm; 130mm High. --Specimen stage size: ∮40mm( Hold 6 specimen cups) --Golden target size: ∮58mm*0.12mm(thickness) --Vacuum detection: Pirani gage -...
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Product Description: Longpu solar vacuum tube adopts interference solar absorption layer and unique three-target magnetron sputtering coating technology.Even at high temperatures ...
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