Results forsputtering targetfrom 321 Products.
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Titanium target 99.999% high-purity sputtering target experimental elemental titanium Customized Titanium Target Titanium Round Target product Pure titanium (TI) target) purity 2N8...
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high purity molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide ...
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High Purity Silver Good Corrosion Resistance Chromium Target,Silver Sputtering Target Chromium (Cr) General Information: Chromium is one of the most popular metals in the world. ...
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Titanium target 99.999% high-purity sputtering target experimental elemental titanium Customized Titanium Target Titanium Round Target product Pure titanium (TI) target) purity 2N8...
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high purity molybdenum target molybdenum sputtering target for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension ...
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High Purity Silver Good Corrosion Resistance Chromium Target,Silver Sputtering Target Chromium (Cr) General Information: Chromium is one of the most popular metals in the world. ...
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titanium Sputter target Ti90Nb10 titanium niobium alloy target titanium round target Material: titanium niobium alloy ti90nb10 Composition: Ti 90% + - 1% Nb 10% + - 1% Conditions: ...
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high purity metal sputtering targets molybdenum target for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T...
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High Purity Molybdenum Tube Molybdenum Rotatable Target for Glass Industry Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat ...
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Titanium Niobium Alloy Target TiNb Target Ti90Nb10 Ti80 Nb20 Usually we will provide a quality inspection report like this with the goods, which shows the chemical composition and ...
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high purity metal sputtering targets tungsten sputtering targets for melting equipment Products detail: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less ...
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High Purity Molybdenum Tube Target used for thin film solar cells new energy Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat ...
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titanium Sputter target Ti90Nb10 titanium niobium alloy target titanium round target Material: titanium niobium alloy ti90nb10 Composition: Ti 90% + - 1% Nb 10% + - 1% Conditions: ...
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high purity flat sputtering targets tungsten sputtering targets for oil industry Products detail: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than ...
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Titanium Niobium Alloy Target TiNb Target Ti90Nb10 Ti80 Nb20 Usually we will provide a quality inspection report like this with the goods, which shows the chemical composition and ...
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Sputtering Tungsten Targets Close Grain For LCD Panel 1. Product Details: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than 20ppm It's widely used in ...
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titanium Sputter round target Ti80Nb20 titanium niobium alloy target Material: titanium niobium alloy ti90nb10 1 Composition: Ti 90% + - 1% Nb 10% + - 1% 2 Composition: Ti 80% + - ...
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titanium Sputter round target Ti80Nb20 titanium niobium alloy target Material: titanium niobium alloy ti90nb10 1 Composition: Ti 90% + - 1% Nb 10% + - 1% 2 Composition: Ti 80% + - ...
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Evaporated Coating Particles High Purity Metal Titanium Target Ti 5N 6N High Purity Metal Titanium Target Ti 5N 6N Magnetron Sputtering Cathode product Pure titanium (TI) target) ...
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Evaporated Coating Particles High Purity Metal Titanium Target Ti 5N 6N High Purity Metal Titanium Target Ti 5N 6N Magnetron Sputtering Cathode product Pure titanium (TI) target) ...
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