Results forsputtering targetfrom 321 Products.
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--Glass processing chamber: ∮100mm; 130mm High. --Specimen stage size: ∮40mm( Hold 6 specimen cups) --Golden target size: ∮58mm*0.12mm(thickness) --Vacuum detection: Pirani gage -...
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Jewelry gold ion plating machine, jewelry PVD plating machine PVD vacuum coating technology in the jewelry industry , one important application is the metal instruments, like: ...
china
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Vertical Single Door Decorative Coating Colors Ceramic Tile Ceramic Bath Fitting PVD Sputtering Equipment 3 Main Parts: Vacuum Chamber, Vacuum Pump, Electrical Cabinet. PVD Coating ...
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micron aluminum coating machine 75mm vacuum deposition machine gold plating machine Patented cathode structure design, multi-section gas path control technology and constant ...
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Product Description: Longpu solar vacuum tube adopts interference solar absorption layer and unique three-target magnetron sputtering coating technology.Even at high temperatures ...
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Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step ...
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Target name: aluminum target Common Purity: 99.9% (3N) 99.99% (4N) 99.999% (5N) 99.9999% (6N) Common dimensions: 100*40mm Maximum size: long 3000mm
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate Titanium target Titanium sputtering target ...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g...
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Graphite PVD Vacuum Coating Machine / Jet Black Decoration PVD Color Finishes Graphite PVD Vacuum Coating Machine Structures: Deposition Sources Steered Circular Arc sources for ...
china
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Longpu solar vacuum tube adopts interference solar absorption layer and unique three-target magnetron sputtering coating technology.Even at high temperatures of 400 degrees,the ...
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Main technical indexes: 1. ultimate vacuum: ≤6.6X10³Pa 2. vacuum acquisition system adopts molecular pump + mechanical pump unit 3. continuous pumping for 30 minutes, the vacuum ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate Titanium target Titanium sputtering target ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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Titanium target High-purity and high-density sputtering targets include: Sputtering target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium ...
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