Results fornickel granular sputter targetfrom 412 Products.
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Product Description: Steam Blowing Target Plate is a type of iron plate designed for the purpose of steam purging. It has a high pressure processing technology and can be used for ...
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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets Au Gold Magnetron Sputtering on Silicon Wafers Summary: With PVD DC sputtering ...
china
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step ...
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purge target plate base and aluminum target plate hrc≥45 customized size Product Description: The Steam Blowing Target Plate is a custom-made product made of high-quality materials...
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Vacuum Flask Copper Plating Equipment, Copper Sputtering Deposition System, TiN and TiC Vacuum Plating The thick copper film is for thermal isulation between inner and outer ...
china
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Magnetron Sputtering Deposition in Medical Treatment Industry Applications Applications Specific Purpose Material Type Medical treatment Biocompatible materials Al2O3, TiO2 Working ...
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target sputtered aluminum sheet Product Description: Steam Blowing Target Plate is made of high pressure steam purge finish Ra1.6 aluminum, with a thickness of 5-10mm, and a ...
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Magnetron Sputtering Sources - Planar Sputtering Cathode Magnetron Sputtering Sources Specifications Key Features 1. Finite element magnetic field design 2. Magnet isolated from ...
china
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Magnetron Sputtering Deposition in Magnetic Recording Industry Applications Applications Specific Purpose Material Type Magnetic recording Vertical magnetic recording film CoCr ...
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Product Description: Steam Blowing Target Plate Our steam blowing target plate is high pressure, specially designed for steam blowing application. The surface is carefully treated ...
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Cylindrical Sputtering Sources, Cylinder Sputtering Cathode, Magnetron Sputtering Source Magnetron Sputtering Sources Specification Key Features 1. Finite element magnetic field ...
china
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Product Description: Steam Blowing Target Plate is an ideal product designed for high pressure steam blowing application. It is made of an aluminum flush tube purge, aluminum ...
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Main Features 1).High deposition rates (~1-3 µm/h) 2).High ionisation, resulting in good adhesion and dense coatings 3).As the target is cooled, little heat to the substrate is ...
china
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Product Description: Steam Blowing Target Plate is a specialized device designed for high-pressure steam purging. It is constructed with a Rectangle shape and has a tolerance of ±0...
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Product Description: Product Overview: Steam Blowing Target Plate The Steam Blowing Target Plate is a high-quality, durable and efficient product designed for a wide range of ...
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Product Description: Steam Blowing Target Plate Our steam blowing target plate is made of high-quality aluminum and cast by advanced processing technology. It is available in ...
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Product Description: Steam Blowing Target Plate is a kind of high pressure processing technology for steam blowing. It is mainly used for continuous sputtering purge iron target ...
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Product Description: Steam Blowing Target Plate is a boiler purge target plate shaft and aluminum target plate with custom size, polishing surface treatment, silver color, 5-10mm ...
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Product Description: This Steam Blowing Target Plate is designed to withstand high pressure. It is made of high-quality materials with a polished surface for maximum durability and ...
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