Results fornickel granular sputter targetfrom 456 Products.
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Working Principle: Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a ...
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Product Description: Steam Blowing Target Plate is a kind of pipe purge sputtering copper target plate and high pressure steam purging target plate, which is designed for steam ...
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Copper/Aluminum/Carbon Sputtering Equipment, High Vacuum Magnetron Sputtering Deposition System UHV Sputtering deposition system uses the sputtering cathodes as the PVD deposition ...
china
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Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) ...
china
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Planar Molybdenum Plate Target 1. Description Of Planar Molybdenum Plate Target: Planar molybdenum targets mainly refer to circular targets and rectangular targets with a certain ...
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Product Description: Steam Blowing Target Plate is a kind of essential part in many industrial processes, which is made of aluminum, copper, iron material with rectangle shape, ...
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Magnetron Sputtering Sources - Planar Sputtering Cathode What is magnetron sputtering technology? Magnetron sputtering is another form of PVD coating technology. Plasma coating ...
china
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Product Description: Our Steam Blowing Target Plate is a custom-made product for boiler purge and high pressure steam blowing. It is made of aluminum and is designed to withstand ...
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PVD Magnetron Sputtering Coating Machine 1. Magnetron sputtering is a plasma coating process where by sputtering material is ejected due to bombardment of ions to the target ...
china
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2.5MPa Steam Blowing Aluminum Target Plate High Temperature Sputtering Aluminum Target Plate Mirror Aluminum Target Plat *, *::before, *::after {box-sizing: border-box; } * {margin...
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PVD Magnetron Sputtering Coating Machine 1. Magnetron sputtering is a plasma coating process where by sputtering material is ejected due to bombardment of ions to the target ...
china
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Product Description: Our Steam Blowing Target Plate is designed with a superior quality custom-made size and a tight tolerance of ± 0.1mm. This product is made of aluminum and iron ...
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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets Au Gold Magnetron Sputtering on Silicon Wafers Summary: With PVD DC sputtering ...
china
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Product Description: Steam Blowing Target Plate This steam blowing target plate is a double mirror high precision aluminum target plate, with a sputtering target and an iron target ...
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Vacuum Flask Copper Plating Equipment, Copper Sputtering Deposition System, TiN and TiC Vacuum Plating The thick copper film is for thermal isulation between inner and outer ...
china
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Product Description: Steam Blowing Target Plate is made of high quality aluminum, copper and iron, and processed by casting technology. It is widely used in steam blowing ...
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Magnetron Sputtering Sources - Planar Sputtering Cathode Magnetron Sputtering Sources Specifications Key Features 1. Finite element magnetic field design 2. Magnet isolated from ...
china
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Product Description: Steam Blowing Target Plate is a type of iron plate designed for the purpose of steam purging. It has a high pressure processing technology and can be used for ...
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Cylindrical Sputtering Sources, Cylinder Sputtering Cathode, Magnetron Sputtering Source Magnetron Sputtering Sources Specification Key Features 1. Finite element magnetic field ...
china
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