Results forfrosting silicon dioxide sputtering targetfrom 1146 Products.
|
|
Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1...
|
|
|
|
|
lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Silicon sputtering targets are a type of material used in the process of sputtering, ...
china
|
|
|
|
|
Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
|
|
|
|
|
Ti Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' ...
|
|
|
|
|
Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
|
|
|
|
|
Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: ...
china
|
|
|
|
|
Molybdenum Target For Vacuum Sputtering Coating 1. Molybdenum target for vacuum sputtering coating description: Molybdenum sputtering targets, namely molybdenum targets, are ...
|
|
|
|
|
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
|
|
|
|
|
Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port ...
|
|
|
|
|
650g Silica Fireproof Blanket 96% Silicone Dioxide Cloth Protection Garment Unionfull Group Ltd has been known to manufacture excellent range of High Silica Cloths. The silica ...
|
|
|
|
|
Good Transparency White Fine Powder Silicon Dioxide Used For Industrial Coatings Silicon dioxide DR-388 uses a unique production process and organic surface treatment, is suitable ...
|
|
|
|
|
Silicon Dioxide Quartz Heater Tube , Uv Glass Tube 1683 Degree Celsius Softening Point Fused Silica Capillary Fused Silica Capillary Tubing Description: Density 2.2x103 kg/m3 ...
china
|
|
|
|
|
Japan NTTAT ADS-127 Silicon Dioxide Final Polishing Film Model:ADS-127 Place of Origin:Japan Quick Detail ● Evenly-sprayed particles on coated surface ● Good intensity & flexility, ...
|
|
|
|
|
Nano Silicon Dioxide CAS#: 14808-60-7 M.W: 60.08 Specification: Type Apperance Particle Size Purity (%) Specific Surface Area (m2/g) PH Character and Application BS-SP15 White ...
|
|
|
|
|
XSG size silicon dioxide spin flash dryer XSG Series High-Speed Rotating Dryer Features 1. This machine combines the whirl technology with the fluidization, ejection and smashing ...
|
|
|
|
|
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
|
|
|
|
|
SiO2 granule 0.5-3mm 1-3mm 2-4mm or customization 99.99% Chemical name: SiO2 Boiling point: 2230℃ Purity: 4N Specification: 1-4mm, particle, target Molecular weight: 60.08 ...
|
|
|
|
|
*, *::before, *::after {box-sizing: border-box;}* {margin: 0;}html, body {height: 100%;}body {line-height: 1.5;-webkit-font-smoothing: antialiased;}img, picture, video, canvas, svg ...
|
|
|
|
|
Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target ...
|
|
|
|
|
10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
|
|
|
You may also be interested in :
