Results for840l sputtering tube targetfrom 1380 Products.
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99.95% High purity Mo1 molybdenum special parts molybdenum sputtering target Molybdenum sputtering targets are a type of material used in the process of sputtering, which is used ...
china
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high quality titanium target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the ...
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99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special ...
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Product Description: Our Steam Blowing Target Plate is designed with a superior quality custom-made size and a tight tolerance of ± 0.1mm. This product is made of aluminum and iron ...
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Titanium Tube Target ASTM B861-06 a 133OD*125ID*2940L Include Flange Titanium Gr2 Name Titanium tube target Standard ASTM B861 Transport Package Vacuum package in wooden case ...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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DC Magnetron Sputtering Coating Machine / DC Sputtering System Magnetron Sputtering Models: DC Sputtering, MF Sputtering, RF Sputtering What is DC Sputtering? DC Sputtering mainly ...
china
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Torich 133*4*4113mm 304L Alloy Sputtering Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
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lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Silicon sputtering targets are a type of material used in the process of sputtering, ...
china
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Product Description: Steam Blowing Target Plate is a kind of pipe purge sputtering copper target plate and high pressure steam purging target plate, which is designed for steam ...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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133*4*4113mm Planar Sputtering Target Alloy Sputtering Target Metal Single Crystals Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
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Product Description: Steam Blowing Target Plate is a kind of essential part in many industrial processes, which is made of aluminum, copper, iron material with rectangle shape, ...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Product Description: Our Steam Blowing Target Plate is a custom-made product for boiler purge and high pressure steam blowing. It is made of aluminum and is designed to withstand ...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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