Results forsio2 silicon dioxide sputtering targetfrom 1127 Products.
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99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special ...
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lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Silicon sputtering targets are a type of material used in the process of sputtering, ...
china
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Low Gloss Performance Silicon Dioxide Used For Leather Coatings Silicon dioxide DR-786 is workable in variety of ink & coatings with the performance of low gloss and anti-settling. ...
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Ti Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' ...
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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Molybdenum Planar Sputtering Targets Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: ...
china
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Molybdenum Target For Vacuum Sputtering Coating 1. Molybdenum target for vacuum sputtering coating description: Molybdenum sputtering targets, namely molybdenum targets, are ...
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96% Silicon Dioxide 650GSM Satin High Silica Cloth High temperature Resistant Product Introduce High silica cloth is a kind of high temperature resistant inorganic fiber, its ...
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Nano Silicon Dioxide CAS#: 14808-60-7 M.W: 60.08 Specification: Type Apperance Particle Size Purity (%) Specific Surface Area (m2/g) PH Character and Application BS-SP15 White ...
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SiO2 granule 0.5-3mm 1-3mm 2-4mm or customization 99.99% Chemical name: SiO2 Boiling point: 2230℃ Purity: 4N Specification: 1-4mm, particle, target Molecular weight: 60.08 ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port ...
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Silica Sleeve Silica Sleeve is braided by silica fiber, SiO2 content≥96%,widely used in aerospace (gas turbine and rocket engines), metallurgical, nuclear power, electricity ...
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Silicon Dioxide Quartz Heater Tube , Uv Glass Tube 1683 Degree Celsius Softening Point Fused Silica Capillary Fused Silica Capillary Tubing Description: Density 2.2x103 kg/m3 ...
china
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Japan NTTAT ADS-127 Silicon Dioxide Final Polishing Film Model:ADS-127 Place of Origin:Japan Quick Detail ● Evenly-sprayed particles on coated surface ● Good intensity & flexility, ...
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XSG size silicon dioxide spin flash dryer XSG Series High-Speed Rotating Dryer Features 1. This machine combines the whirl technology with the fluidization, ejection and smashing ...
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron ...
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Precipitated Silicon Dioxide HS Code: 281122 Used As Anti-Adhering for Powder Coatings Introduction White Carbon Black SiO2 Molecular formula: SiO2 CAS No.: 10279-57-9 H.S. Code: ...
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