Results forti al sputtering targetsfrom 1448 Products.
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Magnetron Sputtering Deposition in Semiconductor Industry Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, wiring film AI, Al-Si, Al-Si-Cu, ...
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Titanium Tube Target Titanium TA2 ASTM B861-06 a 133OD*125ID*2644L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2644 Grade TA2 Packaging Wooden case Port of ...
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Zirconium Sputtering Target Zr Target For Sputtering Coating Zirconium sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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high quality titanium target GR2 GR5 titanium alloy Ti6Al4V The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the ...
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DC Magnetron Sputtering Coating Machine on Glass Mirrors , Titanium Ti Glass Mirror Vacuum Metallizing Equipment DC Sputtering Metallizer on Glass Mirrors, Titanium Ti Glass Mirror ...
china
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target plate device. It is used to ...
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PVD Magnetron Sputtering Deposition Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, wiring film AI, Al-Si, Al-Si-Cu, Cu, Au, Pt, Pd, Ag ...
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Niobium Tube Target Vacuum Coating Target 155OD*125ID*2000 Seamless Tube Item name Niobium Tube Targets Size φ155*Iφ125*2000 Packaging Vacuum package in wooden case Port of place ...
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High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a ...
china
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Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been ...
china
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Titanium Target Cylindirc PVD sputtering target 100x40mm 300x40mm Titanium target is mainly used in mechanical equipment, electronic equipment, electroplating equipment, aviation, ...
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Working Principle: Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a ...
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Product Description: Steam Blowing Target Plate is a kind of pipe purge sputtering copper target plate and high pressure steam purging target plate, which is designed for steam ...
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PVD Magnetron Sputtering Deposition Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, wiring film AI, Al-Si, Al-Si-Cu, Cu, Au, Pt, Pd, Ag ...
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99.95% purity Ta Sputtering target sheet for semiconductor coatings and optical coatings 1. Uses: mainly used in semiconductor coatings and optical coatings. Purity: 99.95% -99.99%...
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Magnetron Sputtering Deposition in Display Industry Applications Applications Specific Purpose Material Type Display Transparent conductive film ITO(In2O; -SnO2) Electrode wiring ...
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Dielectric Films Optical Coating Equipment Ar N2 O2 PVD Magnetron Sputtering Deposition Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, ...
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Dielectric Films Optical Coating Equipment Ar N2 O2 PVD Magnetron Sputtering Deposition Applications Applications Specific Purpose Material Type Semiconductor IC, LSI electrode, ...
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