Results formolybdenum targets for sputtering coatingfrom 25 Products.
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1,Description: Molybdenum sputtering target is a high-purity material used in physical vapor deposition (PVD) processes. It is commonly used in thin film deposition applications ...
china
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1,Description: Material: Molybdenum Sputtering Targets are made of molybdenum, a refractory metal known for its high melting point, excellent thermal and electrical conductivity, ...
china
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Description: Tungsten rods, also known as tungsten round bars, are cylindrical components made from pure tungsten metal. Tungsten is a refractory metal with unique properties that ...
china
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Molybdenum Target For Vacuum Sputtering Coating 1. Molybdenum target for vacuum sputtering coating description: Molybdenum sputtering targets, namely molybdenum targets, are ...
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Molybdenum Rotary Sputtering Target For Magnetron Target 1. Description Of Molybdenum Rotary Sputtering Target For Magnetron Target: The molybdenum rotary sputtering target is a ...
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Tungsten-Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum ...
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high purity molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide ...
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition ...
china
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Titanium Tube Target Titanium TA2 ASTM B861-06 a 133OD*125ID*2644L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2644 Grade TA2 Packaging Wooden case Port of ...
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high purity metal sputtering targets molybdenum target for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T...
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3N5 99.95% Molybdenum Plate Sputtering Target For Vacuum Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g...
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high purity molybdenum target molybdenum sputtering target for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension ...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g...
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Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g...
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high purity bright molybdenum target molybdenum disk for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T...
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Tungsten-Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum ...
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99.95% Molybdenum Products Pure Molybdenum Target For Vacuum Sputtering Coating General Information Item Molybdenum Targets Grade MLa, 364 Density 10.2g/cm3 Melting Point 2610 ...
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High Purity Molybdenum Tube Molybdenum Rotatable Target for Glass Industry Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat ...
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99.95% Pure Molybdenum Sputtering Targets For PVD Coating Introduction of Molybdenum Sputtering Target There are two kinds of molybdenum sputtering targets:molybdenum planar target ...
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
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