Guotaivac Co., Ltd |
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Guotai DC Magnetron Sputtering Machine With Customized Features DISC-SP-3200
1. Application direction: research and teaching
2. Product advantages: Inclined co-sputtering, single chip sending to the sampling chamber (Load-Lock)
3. Product configuration:
★ Sample quantity and size: 1 piece Ф2 inch ~ Ф6 inch
★ Sputtering materials: metal; non-metal; compound and other thin film materials.
★ Sputtering chamber: high vacuum system.
★ Load-Lock: Low vacuum system or high vacuum system. Single-piece, samples are automatically transported.
★ Sputtering unevenness: ≤±3%-±5%
★ Magnetron target: 2-4 pcs; adjustable angle
★ Sputtering direction: sample bottom (sputtering from top to bottom) or sample top (sputtering from bottom to top)
★ Heating: conventional heating, optional high temperature heating
★ Power supply configuration: RF; DC; DC pulse; DC bias
★ Cleaning function: optional Kaufman ion source
★ Fast reaction sputtering function: optional Speedflo
★ Film thickness monitoring function: optional crystal control film thickness online monitoring and end point control
★ Operation mode: automatic + semi-automatic control
For the detailed structure and function of the equipment, please consult the sales engineer.