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[China]
Trade Verify
Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613
Contact name:ZHOU XIN
SHANGHAI ROYAL TECHNOLOGY INC. |
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Verified Suppliers
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Magnetron Sputtering Coating Technology enables for mirros high
throughput demand due to its fast deposition rate.
Unlikely the in-line sputtering system, the low production cost
makes it possible for the entrepreneurs who are aming to start the
business at a low investment.
Key Features:
Hight througput and large bath capability.Highly transparent, electrically conductive, highly reflective solar collectors, selectively reflective corrosion-proof, anti-glaring blue.
General Information
Various coating processes for automotive mirrors has been developed and qualified. Chromium PVD
coating onto float glass substrates as reflection layer is
accomplished by DC-Magnetron sputtering.
Colour appearance of the layers can be generated by introducing of
reactive gases, like Argon, Oxgen and Nitrogen.
Technical Specifications
Description | For Car Mirror | For Car Wheels | ||
| RTSP1400-PLUS | RTSP900 | RTSP1400 | RTSP1800 | |
| Targets Aavailable | Chrominum, Aluminum, Stainless Steel, Copper, Brass, Titanium, Silver etc. | |||
Capacity
| Max. 4.86 sqm | Max. size : 27" x 1 Unit
| Max. size 25" x 4 Units Max. size : 27" x 2 Units | Max. size 22" x 8 Units
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| Deposition Chamber | φ1400 *H1600mm
| φ900 * H900mm
| φ1400 * H1600mm
| φ1800 * H1800mm
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Load Diameter (Max.) | 6*φ360mm | 1 axis | 1 axis | 4 axis * φ560mm
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| Load Height ( Effective) | 1200mm | 700mm | 1100mm | 1400mm |
| Deposition Sources | 4 sets cylinder sputter 1 set planar sputter | 2 sets planar sputter W125*L850mm | 2 sets planar sputter W125*L1350mm | 2 sets planar sputter W125*L1650mm |
| Sputtering Power | Max. 40KW | Max. 30KW | Max. 40KW | Max. 60KW |
| Operation & Control System | CE standard Mitsubishi PLC+ Touch Screen Operation Program with backup
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What is magnetron sputtering technology?
Magnetron sputtering is another form of PVD coating technology.
Plasma coating
Magnetron sputtering is a plasma coating process whereby sputtering
material is ejected due to bombardment of ions to the target
surface. The vacuum chamber of the PVD coating machine is filled
with an inert gas, such as argon. By applying a high voltage, a
glow discharge is created, resulting in acceleration of ions to the
target surface and a plasma coating. The argon-ions will eject
sputtering materials from the target surface (sputtering),
resulting in a sputtered coating layer on the products in front of
the target.
Reactive sputtering
Often an additional gas such as nitrogen or acetylene is used,
which will react with the ejected material (reactive sputtering). A
wide range of sputtered coatings is achievable with this PVD
coating technique. Magnetron sputtering technology is very
advantageous for decretive coating (e.g. Ti, Cr, Zr and Carbon
Nitrides), because of its smooth nature. The same advantage makes
magnetron sputtering widely used for tribological coating in
automotive markets (e.g. CrN, Cr2N and various combinations with DLC coating - Diamond Like Carbon
coating).
Magnetic fields
Magnetron sputtering is somewhat different from general sputtering
technology. The difference is that magnetron sputtering technology
uses magnetic fields to keep the plasma in front of the target,
intensifying the bombardment of ions. A highly dense plasma is the
result of this PVD coating technology.
Magnetron sputtering technology is characterized by:
