High Vacuum Metallizing Thin Film Deposition Equipment, MF and DC Magnetron Sputtering Deposition System

High Vacuum Metallizing Equipment Manufacturer , Thin Film Deposition Equipment , MF Sputtering System

        Royal Technology designed and built the high vacuum sputter deposition systems for various industrial applications: RT1215-SP sputtering vacuum metalizer contains: DC and RF sputtering cathodes. The sputter metalization machine can deposit solid targets like: Chromium, Aluminum, Titanium, Silver, Gold, Stainless Steel, Copper, Stainless Steel on Glass, Ceramic, Metal and alloy, steel, plastic substrates.

The vacuum sputtering coating machine is installed with 2 pairs of MF sputtering cathodes on chamber, and 1 set of Anode Layer Ion source for plasma bombardment cleaning before PVD film deposition and 2 sets DC Sputtering cathodes. 

Royal technology optimized the planar sputtering cathode sources which highly improve the target ultilization rate up to 40%, the closed magnetic field which ensure the deposition films are highly smooth, high dense and strong adhesion properties. 

RTSP1215-3D design illustration

High Vacuum Metallizing Equipment Features:

1. Robust design, good for limited room space

2. Easy access for maintenance and repair

3. Fast pumping system for high yield

4. CE standard electrical enclosure, UL standard is also available.

5. Accurate fabrication workmanship

6. Stable running to guarantee high quality film production.

The key feature is that Royal's customized operation and control program and software, which is available to meet various requests from customer's demands. The control system is PLC + Touch screen:

PLC remote monitoring and control ( Local Area Network )

1) Remote control Team View Program

2) PLC program back up + HMI program back up

3) PC operating environment
System:Window 2000/Window XP/Window 7
Display Pixel:1920*1080

Learn more about the machine and applications available, please contact us now.