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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

Country/Region china
City & Province baoji Shaanxi
Categories Other Titanium
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Product Details

Product Information:

 

Tantalum tube target is a tubular tantalum target, also known as tantalum rotating target.

 

NameTantalum Rotating Target Tantalum Tube Target
Purity≥99.95%
GradeRO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Density16.68g/cm3
Atomic weight180.94788
Sputtering methodDC
Thermal conductivity57 W/m.K
Thermal expansion coefficient6.3 x 10-6 /K
SizeOD: 20~300mm Wall thickness: ≥ 0.5mm

 

 

Application of Ta Rotating Target:

 

Tantalum tube target is a high-purity tantalum raw material for sputter deposition, which can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Details are as follows:


-For semiconductors;
-Chemical Vapor Deposition (CVD) displays;
-Physical Vapor Deposition (PVD) displays;
-Optical applications.

 

Note: We provide customized services. If you can't find the target you want, please contact us directly. We can customize according to your requirements.

 

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