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RTSP1200-PCB- Printed Circuit Board PVD Gold Sputtering

SHANGHAI ROYAL TECHNOLOGY INC.

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Address: 819# SONGWEI ROAD (N.) SONGJIANG INDUSTRIAL ZONE, SHANG HAI, CHINA 201613

Contact name:ZHOU XIN

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SHANGHAI ROYAL TECHNOLOGY INC.

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RTSP1200-PCB- Printed Circuit Board PVD Gold Sputtering

Country/Region china
Categories Other Metals & Metal Products
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Product Details

Technical Background


The RTSP1200-PCB machine is a tailor-designed and fabricated equipment for PCBs plating by magnetron sputtering deposition technology.

Everyone who is involved with the PCB industry knows that PCBs which have copper finishes on the surface requires a protective layer to protect it against from oxidize and deteriorate, meanwhile the film must with high hardness and abrasion resistance to guarantee the lifetime.

Royal Technology spent 6 months in R&D, over 20 times experiment to finalized the proper coating processes. More exciting new is in March 2020, we delivered the massive production machine to our customer’s site with a high accomplishment result.

 

Key Features


Multiple deposition cathodes for fast deposition rate
Strong vacuum pumping system for a short cycle
Anode linear ion source to improve adhesion and high density of deposited films
6 units standard planar cathodes mounting flanges
Flexible coating processes applied
Modular structure design for fast exchange of cathodes and targets

 

                                              Planar Sputtering Cathodes 

 

Technical Specifications

 

DescriptionRTSP1200-PCB
Advantages

Environmentally friendly process

Much lower production cost compared with conventional metal electroplating process

Excellent corrosion and wear resistance

Hign density and high uniformity

Film thickness can be well controlled

Deposited Films

Au gold, Ag silver, Cu copper conductive families films;

Corrosion resistance metal families: Tantalum(Ta), Nickle (Ni), Chrome (Cr), Zirconium(Zr) etc.

Compounded films: carbon-based metal films, Nitride metal films.

Deposition Chamber

Cylinder chamber with vertical orientation, one door structure with front opening method

Chammber inner size: φ1200 * H1500mm

 

Loading Volume (Max.)Central driving rack system, with Max. φ1000mm *H1100
Deposition Sources4 Planar sputtering cathodes + 1 mounting flange for upgrading
Sputtering Deposition PowerMax. 30KW
Pulsed Bias PowerMax. 30KW
Footprint (L*W*H)5000*5000*4500mm
Power Consumption

Max. 105KW

Average:50KW

Operation & Control System

CE standard

Mitsubishi PLC+ Touch Screen

Operation Program with backup

 

These configurations are standard, for a specific developing market and new special coatings, the customized configurations and modifications are available on requests.

 

 

6-RT1200-PCB- Magnetron sputtering deposition equi...   for more details, please download catalogue here. 

 

 

                          Operation and Coating Process Training for Customers

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