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Efficient Innovative Custom PVD Machine CsI High Vacuum Metallizing Machine

SHANGHAI ROYAL TECHNOLOGY INC.

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Contact name:ZHOU XIN

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Efficient Innovative Custom PVD Machine CsI High Vacuum Metallizing Machine

Country/Region china
Categories Electronic Products & Components Processing
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Product Details

X-Ray Scintillator(CsI) Deposition System, CsI High Vacuum Metallizing Machine

 

CsI High Vacuum Deposition System is exclusively designed for CsI metallization on scintillation screens in an extremely high vacuum environment. The CsI scintillators 200~600µm in thickness ranges with high uniformity of thickness and brightness performance.

 

Cesium Iodide (CsI ) Deposition characterizations:


Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose;

 

Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.


Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate

 

The model CsI950A+  is updated based on the 1st generation CsI950, its advanced properties:

 

1. Efficiency:
CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
Double-capacity for max. size substrate: 500 x400mm.

 

2. Repeatability & Reproducibility:
Through high precised parameter control system,
Automated process control software and program,
User friendly operation.

 

3. Reliability:
24/7 days non-stop operation;
Inficon Film Thickness Controller to monitor the film thickness inline.
Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
Rotary racks equipped with Servo-Motor for high accuracy and stability.

 

4. Safety:

High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
All electrodes are equipped with safety protection sleeves.

 

 

 

Technical Parameters

 

DescriptionCsI-950

CsI-950A+

 

Deposition chamber (mm)

 

φ950 x H1350

φ950 x H1350

 

Loading rotary racks12
Evaporation sources2

2

 

Heating method

Iodine tungsten lamp

Max. 800℃

Iodine tungsten lamp

Max. 800℃

Ultimated vacuum pressure (Pa)8.0×10-5Pa8.0×10-5Pa
Magnetic Suspension Molecular Pump1 x 3400L/S

1 x 3400L/S

 

Roots Pump1 x 490m³/h

1 x 490m³/h

 

Rotary Vane Pump1 x 300m³/h

1 x 300m³/h

 

Deposition ControllerQuartz Control x 1

Quartz Control x 1

 

Power Consumption (KW)

Max. approx. 62

Average approx. 32

Max. approx. 65

Average approx. 35

 

 

 

 

X-ray Imaging for medical instrument sample

 

 

 

 

 

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

 

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