Photosensitive Glue Remover Smt Line Equipment for film release MT-4100C

MT-4100C Photosensitive glue remover screen automatic development and stripping machine is designed for automatic removal of residual photosensitive glue after film exposure or laser plate making.  MT-4100C screen automatic development and stripping machine is engineered to provide good quality and automatically remove excess photosensitive glue after laser plating process and automatically release the film. This machine is capable of the automatic removal of residual photosensitive glue after film exposure. MT-4100C development and stripping machine is equipped with a high-quality electric hydraulic pump that provides high-pressure jet washing used for developing or film release.

Function:

1. Automatic development: automatic removal of residual photosensitive glue after film exposure or laser plate making.

Working method: The machine automatically sprays the printing screen after double-sided flushing, so that the printed graphics can appear automatically; the front and rear double spray bars are used for uniform spraying; the spray pressure and time can be adjusted to achieve perfect development.

2. Automatic film release: After the screen is used, the photosensitive glue on the surface of the screen is automatically removed to become a blank screen and used again.

Working mode: The machine automatically sprays the screen printing screen after soaking on both sides to remove the photosensitive glue; using front and rear double spray bars, high-pressure front, and back spray; spray pressure, time can be adjusted, and the film release speed is fast.

Features:

1. High-quality electric hydraulic pump to provide high-pressure jet washing, developing, or film release.

2. The whole structure is made of stainless steel, which is resistant to acid and alkali corrosion and durable.

3. One-button operation, the development or stripping is automatically completed at one time according to the set program.

4. Equipped with a liquid level control mechanism, it will automatically add when the water level is low, and automatically stop when the water level is reached.

5. Equipped with an anti-dry pumping control system to automatically protect the hydraulic pump when the water volume is insufficient.

6. The machine is completely sealed by spraying and developing or stripping, keeping the workshop environment clean and tidy.

7. The developing water or release liquid can be reused, saving water and reducing emissions.

8. Modular controller, easy to repair and maintain.

9. Different procedures correspond to the thin film, thick film development, and release.

Machine specifications:

MT-4100C specification

Maximum screen size: L1000 * W1000 *H40(mm)

Tank capacity: 120L

Development/release time: 1~4min

Drying time: 1~2min

Airflow volume: 800~1000L/min

Gas source: 0.5~0.7Mpa

Exhaust port size: Φ125 × H30 (mm)

Filtering system: 20um

Gas source: 0.5~0.7Mpa

Power supply: AC380V, 50HZ, 4KW

Machine size: L1750 *W1550 * H 2000(mm)

Machine weight: 780KG