Luoyang Hypersolid Metal Tech Co., Ltd |
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Tungsten Rotatable Sputtering Target
Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment and petroleum etc..
PARAMETER
OD(mm) | ID(mm) | Length(mm) | Custom Made |
140-300 | 120-280 | 100-3300 |
Model Number | W1 | |||
Shape | customized | |||
Chemical Composition | 99.95% W |
Feature
1.High density
2.High wear-resistant
3.High thermal conductivity with low thermal expansion coefficient
4.High vibration-damping capacity and high Young’s modulus
5.High oxidation resistance and corrosion resistance
Specification
Atomic number | 74 |
CAS number | 7440-33-7 |
Atomic mass | 183.84 [g/mol] |
Melting point | 3420 °C |
Boiling point | 5555 °C |
Density at 20 °C | 19.25 [g/cm3] |
Crystal structure | Body-centered cubic |
Coefficient of linear thermal expansion at 20 °C | 4.410-6[m/(mK)] |
Thermal conductivity at 20 °C | 164 [W/(mK)] |
Specific heat at 20 °C | 0.13 [J/(gK)] |
Electrical conductivity at 20 °C | 18.2106[S/m] |
Specific electrical resistance at 20 °C | 0.055 [(mm2)/m] |
APPLICATIONS
semiconductor
chemical vapor deposition (CVD)
physical vapor deposition (PVD) display