Baoji Feiteng Metal Materials Co., Ltd. |
|
Titanium Tube Target Vacuum Coating Target 133OD*125ID*840 Seamless Tube ASTM B861-06 a
Item name | Titanium Tube Targets |
Tube Target Size | φ133*Iφ125*840 |
Tube Target Grade | Gr1 |
Tube Target Packaging | Vacuum package in wooden case |
Port of place | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
The coating target is a sputtering source that forms various
functional films on the substrate by magnetron sputtering,
multi-arc ion plating or other types of coating systems under
appropriate technological conditions. To put it simply, the target
material is the target material of high-speed charged particles
bombardment. When used in high-energy laser weapons, different
power densities, different output waveforms and different
wavelengths of laser interact with different targets, different
killing and destruction effects will be produced. For example,
evaporative magnetron sputtering coating is heated evaporation
coating, aluminium film, etc. Change different target materials
(such as aluminium, copper, stainless steel, titanium, nickel
target, etc.), can get different film systems (such as super hard,
wear-resistant, anti-corrosion alloy film, etc.)
In recent years, flat panel display (FPD) has greatly impacted the
computer monitor and TV market dominated by cathode ray tube (CRT),
which will also drive the technology and market demand of ITO
target material. There are two kinds of iTO targets today. One is
sintered by mixing indium oxide and tin oxide powder in nanometer
state, the other is sintered by indium tin alloy target. ITO films
can be prepared by direct current reactive sputtering on indium-tin
alloy targets, but the target surface will be oxidized and the
sputtering rate will be affected, and it is difficult to get large
size gold target. Nowadays, the first method is generally adopted
to produce ITO target material, using L}IRF reactive sputtering
coating. It has a fast deposition rate. And can accurately control
the thickness of the film, high conductivity, good consistency of
the film, strong adhesion to the substrate and other advantages l.
But making targets is difficult because indium oxide and tin oxide
do not sinter together easily. Generally, ZrO2, Bi2O3 and CeO are
used as sintering additives, and target materials with densities of
93%~98% of the theoretical value can be obtained. The performance
of ITO films formed in this way is greatly related to the
additives. Japanese scientists used Bizo as an additive, And Bi2O3
melted at 820Cr, and part of the sintering temperature beyond L500
℃ was volatilized, so that relatively pure ITO target could be
obtained under liquid phase sintering conditions. And the oxide raw
material is not necessarily nanoparticles, which can simplify the
early process. The resistivity of ITO film obtained by using such
targets as Chuan is 8.1 ×10n-cm, which is close to the resistivity
of pure ITO film. The size of FPD and conductive glass are quite
hot, and the width of conductive glass can even reach 3133_. In
order to improve the utilization rate of the target, ITO targets of
different shapes, such as cylindrical, have been developed. In
2000, the State Development Planning Commission and the Ministry of
Science and Technology included ITO large targets in the Guide to
Key Fields of Information Industry with Priority for Current
Development.
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance