Results forpurity sputtering targetfrom 432 Products.
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High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a ...
china
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99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special ...
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High Purity Sputter Coating Tantalum Target Tantalum Disc Target 1. Specifications Of Sputter Coating Tantalum Target: Sputter Coating Tantalum Target Material: R05200, R05400, ...
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High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel ...
china
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Ti Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' ...
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Sputter Target for Pulsed Laser Deposition ( PLD ) systems and DC or RF Magnetron Sputtering Systems We provides a wide range of sputter target including Metal , Alloy , Rare earth ...
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's ...
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Titanium Target Sputtering Coating Titanium High Purity Titanium Target Purity 99.99% Titanium Target Sputtering target (purity: 99.9%-99.999%)Square Pure Titanium Sputtering ...
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 ...
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high purity molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide ...
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Tungsten Product GB/T3875-83 Standard 99.95% min Polished Tungsten Target W Disc Tungsten Sputtering Target For Coating Description: 1. An important way to make thin-film material ...
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Tantalum target Tantalum products Tantalum alloy target Product details Commodity: Tantalum target Purity: ≥99.9% Table.Ⅰ.Chemical composition: Chemistry ppm Description Chief ...
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DC Magnetron Sputtering Coating Machine / DC Sputtering System Magnetron Sputtering Models: DC Sputtering, MF Sputtering, RF Sputtering What is DC Sputtering? DC Sputtering mainly ...
china
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High Quality PVD Coating Machine For Jewelry Other Technical Parameters Chamber Cooling Way Indirect Cooling PLC Brand Mitsubishi DC Magnetron Sputtering Target Amount According To ...
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Product Description: Steam Blowing Target Plate The Steam Blowing Target Plate is an essential component of the steam purging target plate and target plate device. It is used to ...
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Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) ...
china
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Magnetron Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, ...
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Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step ...
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Torich 133*4*4113mm 304L Alloy Sputtering Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
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Multi-Function Magnetron Sputtering Metallizer Used For Coating PET Film Product Description Magnetron sputtering is composed of a vacuum system, a winding system, a magnetron ...
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