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Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry

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Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry

Country/Region china
City & Province chengdu sichuan
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Product Details

Magnetron Sputtering Deposition in Perovskite Thin-film Battery Industry
 
 
Applications

  Applications  Specific Purpose  Material Type
  Perovskite thin-film battery  Transparent conducting layer  ZnO:Al

 
Working Principle
Magnetron sputtering is to constrain and extend the motion paths of electron by magnetic field, change the motion
directions of electron, increase the ionization rate of working gas and effectively use the energy of electrons.
Magnetron sputtering has the following characteristics: rapid deposition rate, high deposition efficiency, suitable for
large-scale application in industrial production; low substrate temperature, suitable for the coating of plastics and
other heat resisting substrates; high purity of the prepared films, good compactness, better film uniformity and strong
film-substrate cohesion; metal, alloy, oxide and other films can be prepared; pollution-free.
 
Features

  Model  MSC-PFB-X—X
  Coating type  Various dielectric films such as metal film, metal oxide and AIN
  Coating temperature range  Normal temperature to 500℃
  Coating vacuum chamber size  700mm*750mm*700mm (Customizable)
  Background vacuum  < 5×10-7mbar
  Coating thickness  ≥ 10nm
  Thickness control precision

  ≤ ±3%

  Maximum coating size  ≥ 100mm (Customizable)
  Film thickness uniformity  ≤ ±0.5%
  Substrate carrier  With planetary rotation mechanism
  Target material  4×4 inches(compatible with 4 inches and below)
  Power supply  The power supplies such as DC, pulse, RF, IF and bias are optional
  Process gas

  Ar, N2, O2

  Note: Customized production available.

                                                                                                                
Coating Sample

 

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Roughly vacuumize;
→ Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;
→ Heating the vacuum chamber until the temperature reaches the target;
→ Implement the constant temperature control;
→ Clean elements;
→ Revolve and back to the origin;
→ Coating film according to process requirements;
→ Lower temperature and stop the pump assembly after coating;
→ Stop working when the automatic operation is finished.
 
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