Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200 Degree
 
Intelligent PECVD Introduction:
PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so the plasma is generated. Plasma's high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most tube PECVD systems, and added a pre-heating zone in the front of the PECVD system. Tests showed that the deposition speed is quicker, the film quality is better, holes are less, and won't crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
Wide application range: metal film, ceramic film, composite film, the continuous growth of various films. Easy to increase function, can expand plasma cleaning etch and other functions
 
 
Main Feature:

• High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
   
• High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution, and heating technology, etc., make the film uniformity index reach 8%
   
• High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
   
• High process stability: Highly stable equipment ensures a continuous and stable process

 
Standard Spares:

• Plugging tube 4 pcs
• Furnace tube 1 pc
• Vacuum pump 1 pc
• Vacuum sealing flange 2 sets
• Vacuum gauge 1 pc
• Gas delivery & vacuum pump
• RF plasma equipment

 
Optional Spares:
 

• Quick release flange, Three-way flange
• 7 inch HD touch scree

 
 
 
Plasma Enhanced Chemical Vapor Deposition Furnace Standard specification:

 
Why Brother's Lab Plasma Enhanced Chemical Vapor Deposition Furnace?

• Manufacturer with 10+ years' experience
• Best quality
• Customized design
• Experienced workers
• Big factory

Customers from more than 30 countries choose us

• Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.

Best service, Fast response

• Free design for special furnace
• Free technical support for the lifetime
• Free sample test

 
If you're interested in our Plasma Enhanced Chemical Vapor Deposition Furnace, contact us now to get a quote!