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PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY

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PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY

Country/Region	china
City & Province	zhengzhou henan
Categories	Laser Equipment Parts

Product Details

SiC PVD Tray

Silicon carbide PVD tray is formed by isostatic pressing process and sintering at high temperature. The outer diameter, thickness, number and size of acupoints, position and shape of the tablet groove can also be finished according to the requirements of the user's design drawings to meet the specific requirements of the user.

Typical applications

Physical Vapor Deposition (PVD) process is used in LED chip manufacturing.

Features and advantages

High density
Good thermal conductivity, low coefficient of expansion and temperature uniformity
Plasma impact resistance
Resistant to all kinds of strong acid and alkali chemical reagent corrosion
After semiconductor grade cleaning

Specifications 230/300/330mm

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