ATOP Water Bucket Magnetron Sputtering PVD Vacuum Coating Machine

 
 
1. High deposition rate, High coating speed, It can be widely used to do the decorative coating, functional
 
coating on a variety of products. So it is a ideal equipment to do the high-grade and best coating for mass
 
production.
 
 
2. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the
 
cathode surface magnetic field near the work piece surface. Then it improves the sputtered atom
 
ionization rate. It keeps the magnetron sputtering uniformity, also can improve the surface shining effect.
 
 
3. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode
 
and the magnetic field structure,. It will happen atomic diffusion between the coating and the material. It
 
also has the advantages that lon Beam Assisted Deposition.
 
 
4. Vacuum pumping system, electric control system and complete vacuum coating system can be
 
customized according to user requirements.
 
 

1.the coating chamber, valves and piping are made of stainless steel vacuum chamber effective diameter

from Φ500 mm to Φ2000 mm;

2. The vacuum system consists of mechanical pump, rotary vane pump, rotz pump and a cold well high

vacuum oil diffusion pump or molecular pump;

3. The coating system adopts multiple flat target or cylindrical target, with multiple dc power or medium

frequency power supply.

4. The auxiliary pumping system adopts a low-temperature water vapor trap;

5. The gas flow meter and flow control (display) control of the pneumatic system are adopted.

6. The electric control system shall set up circuit overload, water breaking and sound alarm device of the

broken air;

7. Control system (touch screen + PLC), display detailed parameters in real time, fully automatic control of

the entire production process, and automatic storage of process parameters.

8. The equipment is equipped with high power bias system and the ionizing source auxiliary deposition

coating;